Influence of magnetic field on the plasma characteristics in planar magnetron sputtering system

Volume 20 No 7 (2022)

Zahraa A. Mohsin , Qusay A. Abbas

DOI: 10.14704/nq.2022.20.7.NQ33085

Abstract

In a planar sputtering system, the effect of the magnetic field on plasma characteristics (with and without magnetic field) According to the findings presented in this paper, when argon pressure rises,the discharge current in the mirrored-field configuration rises at a quicker rate than in the absence of a magnetic field

Keywords

: Mirrored-field configuration, Boltzmann plot, Stark broadening, Electron temperature, Electron density

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