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Volume 19 No 4 (2021)
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Structure Characteristics of TiO2 Thin Films Prepared by DC Reactive Magnetron Sputtering at Low Pressure
A.S. Ahmed, I.H. Kadhim , A.A. Ramadhan
Abstract
Structural properties of TiO2 thin films play a main role in determine the characteristic of the thin films especially their
stability and activity, the total pressure has a great influence in determine the crystallinity of the films and the
orientation of the facets of their structure, especially the two facet (101) and (001), the enhancing the structure
properties will cause to enhance the application efficiency of TiO2 thin films such as the dissociative adsorption of
water and the solar cell
Keywords
Titanium Dioxide (TiO2) Thin Films, DC Magneto-sputtering, XRD, Total Pressure, Compressive Stress, Deviation of Lattice Constant
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