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Volume 19 No 7 (2021)
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Tuning Hybrid Nano-semiconductor-glass Via High Intensity Laser
Suzan B. Mohammed , Hayder J. Abdulrahman , Ayoub A. Bazzaz
Abstract
Conceptually, the high intensity laser represents the simplest thin film deposition techniques that consists of both a
target and a substrate holders housed in a vacuum chamber with a high powered pulsed laser as the external energy
source for evaporation of target material (Semiconductor Glass). Using deposit thin laser films three ranges of
frequencies were produced: (0-15,000 mJ/cm2) as a result tuning of semiconductor was satisfying condition, while the
second, 0-33,000 mJ/cm2 as a result tuning of semiconductor had a stable condition and the last 0-100,000 mJ/cm2 as
a result tuning of semiconductor was unstable condition
Keywords
High Intensity Laser (HIL), Hybrid Nano-semiconductors, Laser Processing, Tuning
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